NEWCREST''S INDUSTRY FIRST APPLICATION OF ERIEZ .
Figure 4 displays the exposure of copper sulphides within copper sulphide bearing particles in the Concentrator 1 tailings stream. In the coarsest fraction above 150 µm, exposure of copper sulphides is low with most particles having the lowest sulphide exposure (<10% ) where recovery via the existing flotation circuit is poorest at only 30%.